- Patent Title: Non-invasive diagnostic method and apparatus for plasma processes
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Application No.: US17770648Application Date: 2020-01-08
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Publication No.: US12340993B2Publication Date: 2025-06-24
- Inventor: Shinjae You , Sangho Lee , Sijun Kim , Jangjae Lee , Yeongseok Lee , Junghyeng Kim
- Applicant: THE INDUSTRY & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY
- Applicant Address: KR Daejeon
- Assignee: THE INDUSTRY & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY
- Current Assignee: THE INDUSTRY & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY
- Current Assignee Address: KR Daejeon
- Priority: KR10-2019-0132290 20191023
- International Application: PCT/KR2020/000321 WO 20200108
- International Announcement: WO2021/080089 WO 20210429
- Main IPC: H01J47/00
- IPC: H01J47/00 ; H01J37/32

Abstract:
Proposed are non-invasive diagnostic method and apparatus for plasma processes in which plasma processes can be monitored in real time by measuring a surface wave resonance frequency generated in plasma or a sheath on the basis of a surface wave resonance principle. The diagnostic method may include a step (S10) of installing at least one probe on one side of an electrostatic chuck (ESC) or on an inner wall of a chamber, a step (S20) of emitting a high frequency onto the plasma or the sheath by the probe, and a step (S30) of detecting a frequency reflected from the plasma or the sheath by the probe. In addition, the diagnostic method may include the step (S40) of extracting a reflection spectrum, a step (S50) of extracting the surface wave resonance frequency, and a step (S60) of extracting electron density or uniformity of the plasma.
Public/Granted literature
- US20220384163A1 DIAGNOSTIC METHOD AND APPARATUS FOR NON-INVASIVE PLASMA PROCESS Public/Granted day:2022-12-01
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