Invention Application
- Patent Title: Designer particles of micron and submicron dimension
- Patent Title (中): 设计颗粒的微米和亚微米尺寸
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Application No.: US09946115Application Date: 2001-09-04
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Publication No.: US20020022124A1Publication Date: 2002-02-21
- Inventor: Rodney S. Ruoff
- Applicant: Washington University
- Applicant Address: null
- Assignee: Washington University
- Current Assignee: Washington University
- Current Assignee Address: null
- Main IPC: B32B003/00
- IPC: B32B003/00 ; G03C001/76

Abstract:
Micron-sized particles are produced in quantity by one of various methods, including generally the steps of preparing a substrate surface through a lithographic process, the surface being characterized by defining a plurality of elements, depositing a layer of particle material on the substrate surface including the elements, processing the substrate surface to isolate the material deposited on the elements, and separating the particles from the elements. The size and shape of the elements predetermine the size and shape of the particles. The elements may comprise, inter alia, pillars of photoresist or spaces on the substrate surrounded and defined by photoresist.
Information query