Invention Application
US20020022124A1 Designer particles of micron and submicron dimension 审中-公开
设计颗粒的微米和亚微米尺寸

Designer particles of micron and submicron dimension
Abstract:
Micron-sized particles are produced in quantity by one of various methods, including generally the steps of preparing a substrate surface through a lithographic process, the surface being characterized by defining a plurality of elements, depositing a layer of particle material on the substrate surface including the elements, processing the substrate surface to isolate the material deposited on the elements, and separating the particles from the elements. The size and shape of the elements predetermine the size and shape of the particles. The elements may comprise, inter alia, pillars of photoresist or spaces on the substrate surrounded and defined by photoresist.
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