Invention Application
- Patent Title: Additives for inhibiting gas hydrate formation
- Patent Title (中): 用于抑制气体水合物形成的添加剂
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Application No.: US10102584Application Date: 2002-03-20
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Publication No.: US20030013614A1Publication Date: 2003-01-16
- Inventor: Peter Klug , Uwe Dahlmann , Michael Feustel
- Applicant: Clariant GmbH
- Applicant Address: null
- Assignee: Clariant GmbH
- Current Assignee: Clariant GmbH
- Current Assignee Address: null
- Priority: DE10114638.8 20010324
- Main IPC: E21B001/00
- IPC: E21B001/00

Abstract:
The invention relates to the use of compounds of the formula (1) 1 in which R1 is C1- to C24-alkyl, C2- to C24-alkenyl or a C6- to C18-aryl radical which may be substituted by a C1- to C12-alkyl group, R2, R3 independently of one another, are hydrogen, C1- to C18-alkyl, or C5- to C7-cycloalkyl, or R2 and R3, including the nitrogen atom to which they are bonded, form a ring of 4 to 8 ring atoms, in which oxygen or nitrogen atoms may also be present in addition to carbon, A are identical or different C2- to C4-alkylene radicals, B is C1- to C7-alkylene, and n is an integer from 1-40, as gas hydrate inhibitors.
Public/Granted literature
- US06894007B2 Additives for inhibiting gas hydrate formation Public/Granted day:2005-05-17
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