Invention Application
US20030062488A1 Large area electron source 失效
大面积电子源

  • Patent Title: Large area electron source
  • Patent Title (中): 大面积电子源
  • Application No.: US10262997
    Application Date: 2002-10-02
  • Publication No.: US20030062488A1
    Publication Date: 2003-04-03
  • Inventor: Richard Lee FinkLeif H. Thuesen
  • Main IPC: H01J033/00
  • IPC: H01J033/00
Large area electron source
Abstract:
By using a large area cathode, an electron source can be made that can irradiate a large area more uniformly and more efficiently than currently available devices. The electron emitter can be a carbon film cold cathode, a microtip or some other emitter. It can be patterned. The cathode can be assembled with electrodes for scanning the electron source.
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