Invention Application
- Patent Title: Chemical bath having liquid level indications in outer trough
- Patent Title (中): 化学浴液在外槽中具有液位指示
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Application No.: US10142795Application Date: 2002-05-13
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Publication No.: US20030209069A1Publication Date: 2003-11-13
- Inventor: Hsuan-Sheng Tung , Hsin-Ta Chien , Jui-Ping Li
- Applicant: SILICON INTEGRATED SYSTEMS CORP.
- Applicant Address: null
- Assignee: SILICON INTEGRATED SYSTEMS CORP.
- Current Assignee: SILICON INTEGRATED SYSTEMS CORP.
- Current Assignee Address: null
- Main IPC: G01F023/00
- IPC: G01F023/00
Abstract:
A chemical bath having liquid level indications in an outer trough is disclosed. The present invention adds an aqueduct in the outer bath of the chemical bath, and the chemical treatment liquid could flow into the aqueduct. According to the Pascal's law, the liquid level of the chemical treatment liquid in the aqueduct is the same with the liquid level of the chemical treatment liquid in the outer bath. Therefore, the level height of the chemical treatment liquid in the outer bath is observed from the transparent aqueduct by the naked eyes. The present invention abridges the complicated checkup steps, so that the producing time of apparatuses is increased and the amount of the wastes chemicals is decreased.
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