Invention Application
US20040087239A1 Surface conduction electron-emitting device and manufacturing method of image-forming apparatus
审中-公开
表面传导电子发射器件和图像形成装置的制造方法
- Patent Title: Surface conduction electron-emitting device and manufacturing method of image-forming apparatus
- Patent Title (中): 表面传导电子发射器件和图像形成装置的制造方法
-
Application No.: US10685420Application Date: 2003-10-16
-
Publication No.: US20040087239A1Publication Date: 2004-05-06
- Inventor: Taku Shimoda , Masahiro Terada , Shosei Mori
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP TOKYO
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP TOKYO
- Priority: JP2002-317444 20021031
- Main IPC: H01J009/04
- IPC: H01J009/04

Abstract:
A manufacturing method of forming at low costs a surface conduction electron-emitting device by which microminiaturization can be easily realized and electron-emitting characteristics which are uniform over a large area can be obtained is provided. A resin pattern with ion-exchange performance is formed on a substrate, a solution containing a metal component is absorbed to the resin pattern portion by using a deionization reaction, thereafter, the resin pattern is baked to thereby form an electroconductive thin film, and a forming operation is executed to the obtained electroconductive thin film, thereby manufacturing the surface conduction electron-emitting device.
Information query