Invention Application
- Patent Title: High flux X-ray source
- Patent Title (中): 高通量X射线源
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Application No.: US10753904Application Date: 2004-01-08
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Publication No.: US20040228445A1Publication Date: 2004-11-18
- Inventor: Damian Kucharczyk
- Applicant: OXFORD DIFFRACTION LTD.
- Applicant Address: GB Oxfordshire
- Assignee: OXFORD DIFFRACTION LTD.
- Current Assignee: OXFORD DIFFRACTION LTD.
- Current Assignee Address: GB Oxfordshire
- Priority: GB0306829.3 20030325
- Main IPC: H05H001/00
- IPC: H05H001/00 ; G21G004/00 ; H01J035/00

Abstract:
The present invention provides a high flux X-ray source 100 comprising a sealed X-ray tube contained within an X-ray shield (101), an optic housing 103 containing a multi-layer optic for collecting and focussing X-rays generated in the sealed X-ray tube, and an X-ray beam conditioner 104. The multi-layer optic 103 is located at a predetermined distance from the sealed X-ray tube 101, with the optic housing 103 being adjustable relative to the sealed X-ray tube 101 and the beam conditioner 104 adjustable relative to the optic housing 103. The use of a multi-layer optic provides for the efficient collection and focussing of X-rays generated in a compact sealed tube and wavelength selectively enables it to act as a monochromator, providing a beam of X-rays with a predetermined range of photon energy.
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