Invention Application
- Patent Title: Device and method for melting a substance with the occurrence of a low level of contamination
- Patent Title (中): 发生低水平污染物质的熔化装置和方法
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Application No.: US10490803Application Date: 2002-09-12
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Publication No.: US20050005646A1Publication Date: 2005-01-13
- Inventor: Michael Leister , Ernst-Walter Schafer , Leopold Eichberg , Volker Ohmstede
- Applicant: Michael Leister , Ernst-Walter Schafer , Leopold Eichberg , Volker Ohmstede
- Priority: DE10148754.1 20011002; DE10149309.6 20011002; DE10202024.8 20020118
- International Application: PCT/EP02/10242 WO 20020912
- Main IPC: C03B5/06
- IPC: C03B5/06 ; C03B1/02 ; C03B3/00 ; C03B5/02 ; C03B5/18 ; C03B5/187 ; C03B5/193 ; C03B5/20 ; C03B5/26 ; C03C3/097 ; C03C4/00
Abstract:
An apparatus and a method for low-contamination melting of high-purity, aggressive and/or high-melting glass or glass-ceramic are provided. For this purpose, a melt is heated in a crucible or melting skull crucible by means of high-frequency radiation and is mixed or homogenized in the melting crucible. A gas nozzle, from which gas bubbles, e.g. oxygen bubbles (known as O2 bubbling), escape into the melt, is provided at the base of the crucible.
Public/Granted literature
- US07296441B2 Device and method for melting a substance with the occurrence of a low level of contamination Public/Granted day:2007-11-20
Information query
