Invention Application
- Patent Title: Multiple electron beam systems
- Patent Title (中): 多电子束系统
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Application No.: US10856111Application Date: 2004-05-28
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Publication No.: US20050264148A1Publication Date: 2005-12-01
- Inventor: Juan Maldonado , Steven Coyle
- Applicant: Juan Maldonado , Steven Coyle
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Main IPC: H01J37/073
- IPC: H01J37/073 ; H01J43/00 ; H01J43/04

Abstract:
A multiple electron beam source comprises a photon source to generate a photon beam, a lens to focus the photon beam, a photocathode having a photon receiving surface and an electron emitting surface, and an array of electron transmission gates spaced apart from the electron emitting surface of the photocathode by a distance dg. Each electron transmission gate comprises a membrane; an anode on a first surface of the membrane; an insulator on a second surface of the membrane; an aperture through the anode, insulator and membrane; and a gate electrode on the insulator. The gate electrode is positioned about the aperture and capable of receiving a gate control voltage that controls the transmission of electrons through that electron transmission gate. In one version, the multiple electron beam source comprises a photocathode stage assembly to move the photocathode relative to the array of electron transmission gates. In one version, the multiple electron beam source also comprises a plasmon-generating photon transmission plate comprising an array of photon transmission apertures and exterior surfaces capable of supporting plasmons.
Public/Granted literature
- US07301263B2 Multiple electron beam system with electron transmission gates Public/Granted day:2007-11-27
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