Invention Application
US20060060558A1 Method of fabricating package substrate using electroless nickel plating
审中-公开
使用化学镀镍制造封装衬底的方法
- Patent Title: Method of fabricating package substrate using electroless nickel plating
- Patent Title (中): 使用化学镀镍制造封装衬底的方法
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Application No.: US11094618Application Date: 2005-03-30
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Publication No.: US20060060558A1Publication Date: 2006-03-23
- Inventor: Duck Maeng , Byung Sun , Jong Bae , Tae Kim
- Applicant: Duck Maeng , Byung Sun , Jong Bae , Tae Kim
- Applicant Address: KR Kyunggi-do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Kyunggi-do
- Priority: KR2004-75512 20040921
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01B13/00

Abstract:
Disclosed is a method of fabricating a package substrate using electroless nickel plating. The method includes preparing a base substrate, on which an internal layer circuit pattern is formed through a predetermined masking process; forming an insulating layer on the base substrate to achieve interlayer electric insulation; forming a first via hole through the insulating layer to achieve interlayer electric connection; forming a seed layer on the insulating layer through which the first via hole is formed; and forming an external layer circuit pattern on the seed layer through the other predetermined masking process. The seed layer is partially or selectively flash etched so as to prevent via open and undercut formed at the external layer circuit pattern.
Information query