Invention Application
- Patent Title: HYDROGEN IODIDE MANUFACTURING METHOD AND HYDROGEN IODIDE MANUFACTURING APPARATUS
- Patent Title (中): 氢碘化物制造方法和氢碘化物制造装置
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Application No.: US11458537Application Date: 2006-07-19
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Publication No.: US20070020169A1Publication Date: 2007-01-25
- Inventor: Ryouta TAKAHASHI , Hideki Nakamura , Kazuo Murakami , Haruhiko Takase , Noboru Jimbo , Kazuya Yamada
- Applicant: Ryouta TAKAHASHI , Hideki Nakamura , Kazuo Murakami , Haruhiko Takase , Noboru Jimbo , Kazuya Yamada
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Priority: JP2005-213111 20050722
- Main IPC: C01B7/01
- IPC: C01B7/01

Abstract:
A hydrogen iodide manufacturing method which includes a step of producing aqueous solution of hydrogen iodide and sulfuric acid by causing iodine-containing aqueous solution and sulfur dioxide to react with each other in a pressurized condition. The pressurized condition may be of not lower than 0.1 MPa in gauge pressure. The method may further include: a separation step of adding iodine to the aqueous solution of hydrogen iodide and separating an upper phase containing sulfuric acid relatively to a large extent and a lower phase containing hydrogen iodide relatively to a large extent; and a step of producing hydrogen iodide by adding sulfur dioxide to the upper phase in a pressurized condition and extracting the produced hydrogen iodide to the lower phase.
Public/Granted literature
- US07442363B2 Hydrogen iodide manufacturing method and hydrogen iodide manufacturing apparatus Public/Granted day:2008-10-28
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