Invention Application
US20070069149A1 Combined aperture holder, beam blanker and vacuum feed through for electron beam, ion beam charged particle devices 审中-公开
组合式光阑支架,光束消隐器和真空馈电用于电子束,离子束带电粒子装置

  • Patent Title: Combined aperture holder, beam blanker and vacuum feed through for electron beam, ion beam charged particle devices
  • Patent Title (中): 组合式光阑支架,光束消隐器和真空馈电用于电子束,离子束带电粒子装置
  • Application No.: US11238570
    Application Date: 2005-09-29
  • Publication No.: US20070069149A1
    Publication Date: 2007-03-29
  • Inventor: Earl Weltmer
  • Applicant: Earl Weltmer
  • Main IPC: H01J3/38
  • IPC: H01J3/38
Combined aperture holder, beam blanker and vacuum feed through for electron beam, ion beam charged particle devices
Abstract:
A combined aperture, aperture holder, vacuum feed through and beam blanker for a beam of charged particles fits into an existing aperture in a charged particle beam device such as a scanning electron microscope or an ion beam chamber.
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