Invention Application
US20070125575A1 Dielectric lamination structure, manufacturing method of a dielectric lamination structure, and wiring board including a dielectric lamination structure
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电介质层叠结构体,电介质层叠结构体的制造方法以及包含电介质层叠结构的配线基板
- Patent Title: Dielectric lamination structure, manufacturing method of a dielectric lamination structure, and wiring board including a dielectric lamination structure
- Patent Title (中): 电介质层叠结构体,电介质层叠结构体的制造方法以及包含电介质层叠结构的配线基板
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Application No.: US11634170Application Date: 2006-12-06
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Publication No.: US20070125575A1Publication Date: 2007-06-07
- Inventor: Yasuhiko Inui , Takamichi Ogawa , Seiji Ichiyanagi , Jun Otsuka , Manabu Sato
- Applicant: Yasuhiko Inui , Takamichi Ogawa , Seiji Ichiyanagi , Jun Otsuka , Manabu Sato
- Assignee: NGK SPARK PLUG CO., LTD.
- Current Assignee: NGK SPARK PLUG CO., LTD.
- Priority: JPP2005-353791 20051207; JPP2006-014353 20060123; JPP2006-283292 20061018
- Main IPC: H05K1/00
- IPC: H05K1/00

Abstract:
A dielectric structure comprising: a metal foil; a dielectric layer; and a conductor layer provided in this order, wherein the metal foil has a thickness of from 10 to 40 μm, the dielectric layer has a thickness of from 0.3 to 5 μm, and the conductor layer has a thickness of from 0.3 to 10 μm, the dielectric structure has plural vias which are separated from each other, and which penetrate through both of the dielectric layer and the conductor layer, and the vias of the dielectric layer have different diameters which are in a range of from 100 to 300 μm, a diameter of each of the vias of the conductor layer is larger than a diameter of a corresponding via of the dielectric layer by 5 to 50 μm, and a minimum via pitch is from 100 to 350 μm.
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