Invention Application
- Patent Title: Method and apparatus for inspection of semiconductor devices
- Patent Title (中): 用于半导体器件检查的方法和装置
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Application No.: US11348029Application Date: 2006-02-06
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Publication No.: US20070181809A1Publication Date: 2007-08-09
- Inventor: Mau-Song Chou , Jonathan Arenberg , Mark Menard , Thomas Chung
- Applicant: Mau-Song Chou , Jonathan Arenberg , Mark Menard , Thomas Chung
- Main IPC: G02F1/01
- IPC: G02F1/01

Abstract:
A technique for providing high-contrast images of defects in semiconductor devices and arrays of such devices, by illuminating each semiconductor device under inspection with broadband infrared radiation, and then forming an image of radiation that is specularly reflected from the semiconductor device. Many semiconductor devices and arrays of such devices have a metal backing layer that specularly reflects the illumination back into an appropriately positioned and aligned camera, selected to be sensitive to infrared wavelengths at which the semiconductor device materials are relatively transparent.
Public/Granted literature
- US07326929B2 Method and apparatus for inspection of semiconductor devices Public/Granted day:2008-02-05
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