Invention Application
- Patent Title: Micro-Electromechanical Capacitive Strain Sensor
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Application No.: US11684592Application Date: 2007-03-09
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Publication No.: US20080034883A1Publication Date: 2008-02-14
- Inventor: Suryakala Majeti
- Applicant: Suryakala Majeti
- Main IPC: G01L1/22
- IPC: G01L1/22 ; H01C17/00

Abstract:
A micro-electromechanical capacitive strain sensor. The micro-electromechanical capacitive strain sensor comprises a first bent beam, a second bent beam, and a straight center beam. The first bent beam, second bent beam, and straight center beam are aligned in the X-axis with the straight center beam located between the first and second bent beams. The first bent beam, second bent beam, and straight center beam are disposed between two anchors. The two anchors are aligned in the Y-axis. The first bent beam is bent away from the center beam and the second bent beam is bent towards the center beam to provide a set of differential capacitors with respect to the center beam, wherein the center beam serves as a common reference with respect to the first and second bent beams.
Public/Granted literature
- US07380461B2 Micro-electromechanical capacitive strain sensor Public/Granted day:2008-06-03
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