Invention Application
- Patent Title: Projection objective and projection exposure apparatus including the same
- Patent Title (中): 投影物镜与投影曝光装置相同
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Application No.: US11727013Application Date: 2007-03-23
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Publication No.: US20080037112A1Publication Date: 2008-02-14
- Inventor: Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
- Applicant: Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
- Applicant Address: DE Oberkochen
- Assignee: CARL ZEISS SMT AG
- Current Assignee: CARL ZEISS SMT AG
- Current Assignee Address: DE Oberkochen
- Main IPC: G02B27/18
- IPC: G02B27/18 ; G02B17/08
Abstract:
A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
Public/Granted literature
- US07738188B2 Projection objective and projection exposure apparatus including the same Public/Granted day:2010-06-15
Information query
