Invention Application
US20100037963A1 PROCESS-LIQUID SUPPLY MECHANISM AND PROCESS-LIQUID SUPPLY METHOD
有权
过程液体供应机制和工艺液体供应方法
- Patent Title: PROCESS-LIQUID SUPPLY MECHANISM AND PROCESS-LIQUID SUPPLY METHOD
- Patent Title (中): 过程液体供应机制和工艺液体供应方法
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Application No.: US12593996Application Date: 2008-09-22
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Publication No.: US20100037963A1Publication Date: 2010-02-18
- Inventor: Shu Yamamoto
- Applicant: Shu Yamamoto
- Applicant Address: JP Minato-ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-ku
- Priority: JP2007-265458 20071011
- International Application: PCT/JP2008/067102 WO 20080922
- Main IPC: B01J4/00
- IPC: B01J4/00 ; B67D7/78 ; G01F23/00

Abstract:
A process-liquid supply part includes: a supply tank configured to contain a process liquid; a level gauge pipe connected to the supply tank, the level gauge pipe being provided with level sensors for detecting a remaining amount of the process liquid contained in the supply tank; and a measuring part configured to measure a remaining amount of the process liquid based on signals from the level sensors provided on the level gauge pipe. Connected to the supply tank are a process-liquid supply pipe configured to drain the process liquid contained in the supply tank, and a process-liquid return pipe configured to introduce the process liquid drained through the process-liquid supply pipe to the supply tank. A connection pipe, in which an openable and closable valve is provided, disposed between the process-liquid supply pipe or the process-liquid return pipe and the level gauge pipe.
Public/Granted literature
- US08286482B2 Process-liquid supply mechanism and process-liquid supply method Public/Granted day:2012-10-16
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