Invention Application
US20100055009A1 TREATING CHAMBER FOR HIGH-STRENGTH PULSE ELECTRIC FIELD AND HIGH-FREQUENCY ELECTRIC FIELD TREATING EQUIPMENT 审中-公开
高强度脉冲电场和高频电场处理设备的处理室

  • Patent Title: TREATING CHAMBER FOR HIGH-STRENGTH PULSE ELECTRIC FIELD AND HIGH-FREQUENCY ELECTRIC FIELD TREATING EQUIPMENT
  • Patent Title (中): 高强度脉冲电场和高频电场处理设备的处理室
  • Application No.: US12312657
    Application Date: 2007-12-04
  • Publication No.: US20100055009A1
    Publication Date: 2010-03-04
  • Inventor: Jinquan Chen
  • Applicant: Jinquan Chen
  • Priority: CN200710008437.X 20070112
  • International Application: PCT/CN2007/003436 WO 20071204
  • Main IPC: A61K39/02
  • IPC: A61K39/02
TREATING CHAMBER FOR HIGH-STRENGTH PULSE ELECTRIC FIELD AND HIGH-FREQUENCY ELECTRIC FIELD TREATING EQUIPMENT
Abstract:
It's referred to a continuous fluid treatment chamber designed for pulsed electric field or radio frequency electric field. It's a chamber with two metal hollow tubes and isolating ring. Isolating ring is between two metal hollow tubes which are connected with high intensive pulse or radio frequency generator respectively. The main characteristics are as follow: In two metal hollow tubes near the isolating ring there is at least one metal conductor or lead. With this chamber, the capacity can be greatly improved (the material can pass through any large diameter tube, not sew). And the electric field distribution can be more uniform and the treatment of fluid will be highly efficient. It's benefit for pulse electric field or radio frequency electric field to be applied in industry.
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