Invention Application
US20100123897A1 SYSTEMS AND METHODS FOR CORRECTING OPTICAL REFLECTANCE MEASUREMENTS
审中-公开
用于校正光学反射测量的系统和方法
- Patent Title: SYSTEMS AND METHODS FOR CORRECTING OPTICAL REFLECTANCE MEASUREMENTS
- Patent Title (中): 用于校正光学反射测量的系统和方法
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Application No.: US12568363Application Date: 2009-09-28
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Publication No.: US20100123897A1Publication Date: 2010-05-20
- Inventor: Ye Yang , Babs R. Soller , Olusola O. Soyemi , Michael A. Shear
- Applicant: Ye Yang , Babs R. Soller , Olusola O. Soyemi , Michael A. Shear
- Assignee: University of Massachusetts, a Massachusetts corporation
- Current Assignee: University of Massachusetts, a Massachusetts corporation
- Main IPC: G01J3/00
- IPC: G01J3/00 ; G01N21/55

Abstract:
We disclose measurement systems and methods for measuring analytes in target regions of samples that also include features overlying the target regions. The systems include: (a) a light source; (b) a detection system; (c) a set of at least first, second, and third light ports which transmit light from the light source to a sample and receive and direct light reflected from the sample to the detection system, generating a first set of data including information corresponding to both an internal target within the sample and features overlying the internal target, and a second set of data including information corresponding to features overlying the internal target; and (d) a processor configured to remove information characteristic of the overlying features from the first set of data using the first and second sets of data to produce corrected information representing the internal target.
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