Invention Application
US20120007220A1 Method for Reducing Chip Warpage 有权
降低芯片翘曲的方法

Method for Reducing Chip Warpage
Abstract:
A method of forming an integrated circuit structure including providing a wafer comprising a front surface and a back surface, wherein the wafer comprises a chip; forming an opening extending from the back surface into the chip; filling an organic material in the opening, wherein substantially no portion of the organic material is outside of the opening and on the back surface of the wafer; and baking the organic material to cause a contraction of the organic material.
Public/Granted literature
Information query
Patent Agency Ranking
0/0