Invention Application
- Patent Title: Method of fabricating composite field emission source
- Patent Title (中): 复合场致发射源的制作方法
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Application No.: US13317955Application Date: 2011-10-31
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Publication No.: US20120090986A1Publication Date: 2012-04-19
- Inventor: Jian-Min Jeng , Jyi-Tsong Lo , Wen-Ching Shih , Wei-Lung Tasi
- Applicant: Jian-Min Jeng , Jyi-Tsong Lo , Wen-Ching Shih , Wei-Lung Tasi
- Applicant Address: TW Taipei TW Taipei
- Assignee: TATUNG UNIVERSITY,Tatung Company
- Current Assignee: TATUNG UNIVERSITY,Tatung Company
- Current Assignee Address: TW Taipei TW Taipei
- Priority: TW96150312 20071226
- Main IPC: C23C14/35
- IPC: C23C14/35 ; B82Y40/00

Abstract:
A method of fabricating a composite field emission source is provided. A first stage of film-forming process is performed by using RF magnetron sputtering, so as to form a nano structure film on a substrate, in which the nano structure film is a petal-like structure composed of a plurality of nano graphite walls. Afterward, a second stage of film-forming process is performed for increasing carbon accumulation amount on the nano structure film and thereby growing a plurality of nano coral-like structures on the petal-like structure. Therefore, the composite field emission source with high strength and nano coral-like structures can be obtained, whereby improving the effect and life of electric field emission.
Public/Granted literature
- US09005407B2 Method of fabricating composite field emission source Public/Granted day:2015-04-14
Information query
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