Invention Application
US20120121857A1 METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
有权
生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法
- Patent Title: METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
- Patent Title (中): 生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法
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Application No.: US13295652Application Date: 2011-11-14
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Publication No.: US20120121857A1Publication Date: 2012-05-17
- Inventor: Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
- Applicant: Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2009-116488 20090513
- Main IPC: C03C3/04
- IPC: C03C3/04 ; B32B3/00 ; C03B25/00
Abstract:
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
Public/Granted literature
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