Invention Application
- Patent Title: ULTRAVIOLET IRRADIATION DEVICE
- Patent Title (中): 超紫外线辐射装置
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Application No.: US13392560Application Date: 2010-08-03
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Publication No.: US20120161104A1Publication Date: 2012-06-28
- Inventor: Koichi Okamoto , Mitsuru Funato , Yoichi Kawakami , Ken Kataoka , Hiroshige Hata
- Applicant: Koichi Okamoto , Mitsuru Funato , Yoichi Kawakami , Ken Kataoka , Hiroshige Hata
- Applicant Address: JP Chiyoda-ku, Tokyo JP Kyoto-shi, Kyoto
- Assignee: Ushio Denki Kabushiki Kaisha,Kyoto University
- Current Assignee: Ushio Denki Kabushiki Kaisha,Kyoto University
- Current Assignee Address: JP Chiyoda-ku, Tokyo JP Kyoto-shi, Kyoto
- Priority: JP2009-199454 20090831
- International Application: PCT/JP2010/063102 WO 20100803
- Main IPC: H01L33/06
- IPC: H01L33/06

Abstract:
An ultraviolet irradiation device having a simple structure without using a pn junction, which can efficiently utilize a surface plasmon polariton and can emit ultraviolet light of a specific wavelength at a high efficiency. The device has at least one semiconductor multilayer film element and an electron beam irradiation source which are provided in a container having an ultraviolet-ray transmitting window and is vacuum-sealed, wherein the film element has an active layer formed of InxAlyGa1-x-yN (wherein 0≦x≦1, 0≦y≦1, and x+y≦1) and having a single or multiple quantum well structure and a metal film formed on an upper surface of the active layer, composed of metal particles of aluminum or an aluminum alloy and having a nano-structure formed of the metal particles, wherein ultraviolet light is emitted to the outside through the transmitting window by irradiating the film element with electron beams from the irradiation source.
Information query
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