Invention Application
- Patent Title: ETCHING COMPOSITION
- Patent Title (中): 蚀刻组合物
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Application No.: US13005793Application Date: 2011-01-13
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Publication No.: US20120180852A1Publication Date: 2012-07-19
- Inventor: LAP-TAK ANDREW CHENG , ZHE CHENG , CHENG-YU LAI , MEIJUN LU
- Applicant: LAP-TAK ANDREW CHENG , ZHE CHENG , CHENG-YU LAI , MEIJUN LU
- Applicant Address: US DE Wilmington
- Assignee: E.I. DU PONT DE NEMOURS AND COMPANY
- Current Assignee: E.I. DU PONT DE NEMOURS AND COMPANY
- Current Assignee Address: US DE Wilmington
- Main IPC: H01L31/02
- IPC: H01L31/02 ; C09K13/00 ; C09K13/04 ; H01L31/18

Abstract:
The invention relates to a chemical etching composition and to methods to produce a photovoltaic cell with transparent regions. The methods comprise a step to locally dispense an etching composition on the photovoltaic cell in a pattern, or adjacent to the edge thereof; an optional step to apply heat to the cell; and a step to remove the etching composition. The methods are further characterized by the chemical removal of one or more chemically distinctive layers of the photovoltaic cell where the etching composition is applied. The methods may be used to produce a thin film photovoltaic panel.
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