Invention Application
US20130077761A1 ULTRA THIN RADIATION WINDOW AND METHOD FOR ITS MANUFACTURING 有权
超薄型辐射窗及其制造方法

  • Patent Title: ULTRA THIN RADIATION WINDOW AND METHOD FOR ITS MANUFACTURING
  • Patent Title (中): 超薄型辐射窗及其制造方法
  • Application No.: US13700791
    Application Date: 2010-10-08
  • Publication No.: US20130077761A1
    Publication Date: 2013-03-28
  • Inventor: Heikki Johannes Sipilä
  • Applicant: Heikki Johannes Sipilä
  • Applicant Address: FI Espoo
  • Assignee: HS FOILS OY
  • Current Assignee: HS FOILS OY
  • Current Assignee Address: FI Espoo
  • Priority: FI20105626 20100603
  • International Application: PCT/FI2010/050781 WO 20101008
  • Main IPC: G21K1/00
  • IPC: G21K1/00 H01L31/028
ULTRA THIN RADIATION WINDOW AND METHOD FOR ITS MANUFACTURING
Abstract:
For manufacturing a radiation window for an X-ray measurement apparatus, and etch stop layer is first produced on a polished surface of a carrier. A thin film deposition technique is used to produce a structural layer on an opposite side of said etch stop layer than said carrier. The combined structure comprising said carrier, said etch stop layer, and said structural layer is attached to a region around an opening in a support structure with said structural layer facing said support structure. The carrier is etched away.
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