Invention Application
- Patent Title: ULTRA THIN RADIATION WINDOW AND METHOD FOR ITS MANUFACTURING
- Patent Title (中): 超薄型辐射窗及其制造方法
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Application No.: US13700791Application Date: 2010-10-08
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Publication No.: US20130077761A1Publication Date: 2013-03-28
- Inventor: Heikki Johannes Sipilä
- Applicant: Heikki Johannes Sipilä
- Applicant Address: FI Espoo
- Assignee: HS FOILS OY
- Current Assignee: HS FOILS OY
- Current Assignee Address: FI Espoo
- Priority: FI20105626 20100603
- International Application: PCT/FI2010/050781 WO 20101008
- Main IPC: G21K1/00
- IPC: G21K1/00 ; H01L31/028

Abstract:
For manufacturing a radiation window for an X-ray measurement apparatus, and etch stop layer is first produced on a polished surface of a carrier. A thin film deposition technique is used to produce a structural layer on an opposite side of said etch stop layer than said carrier. The combined structure comprising said carrier, said etch stop layer, and said structural layer is attached to a region around an opening in a support structure with said structural layer facing said support structure. The carrier is etched away.
Public/Granted literature
- US09607723B2 Ultra thin radiation window and method for its manufacturing Public/Granted day:2017-03-28
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