Invention Application
US20130092657A1 CROSS-LINKING AND MULTI-PHASE ETCH PASTES FOR HIGH RESOLUTION FEATURE PATTERNING
审中-公开
用于高分辨率特征的交叉连接和多相蚀刻膏
- Patent Title: CROSS-LINKING AND MULTI-PHASE ETCH PASTES FOR HIGH RESOLUTION FEATURE PATTERNING
- Patent Title (中): 用于高分辨率特征的交叉连接和多相蚀刻膏
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Application No.: US13703966Application Date: 2011-05-17
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Publication No.: US20130092657A1Publication Date: 2013-04-18
- Inventor: Jennifer Gillies , Ralf Kuegler , Eric Stern , Brian Mayers , Patrick Reust , Lindsay Hunting
- Applicant: Jennifer Gillies , Ralf Kuegler , Eric Stern , Brian Mayers , Patrick Reust , Lindsay Hunting
- Applicant Address: US MA Cambridge DE Darmstadt
- Assignee: NANO TERRA, INC.,MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
- Current Assignee: NANO TERRA, INC.,MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
- Current Assignee Address: US MA Cambridge DE Darmstadt
- International Application: PCT/EP11/02427 WO 20110517
- Main IPC: C09K13/06
- IPC: C09K13/06
Abstract:
The present invention relates to a novel etching media in the form of printable, homogeneous etching pastes with non-Newtonian flow properties for the improved etching of inorganic oxides and silicon surfaces and which allow to prepare smaller features.
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