Invention Application
- Patent Title: EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
- Patent Title (中): 极光紫外线发光装置
-
Application No.: US14048654Application Date: 2013-10-08
-
Publication No.: US20140034852A1Publication Date: 2014-02-06
- Inventor: Kouji KAKIZAKI , Tooru ABE , Osamu WAKABAYASHI
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Priority: JP2010-055153 20100311; JP2011-018748 20110131
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.
Information query