Invention Application
- Patent Title: Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
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Application No.: US14011663Application Date: 2013-08-27
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Publication No.: US20140055788A1Publication Date: 2014-02-27
- Inventor: Arie Jeffrey Maria DEN BOEF , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
Public/Granted literature
- US08760662B2 Method and apparatus for angular-resolved spectroscopic lithography characterization Public/Granted day:2014-06-24
Information query
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