Invention Application
- Patent Title: Grazing Incidence Reflectors, Lithographic Apparatus, Methods for Manufacturing a Grazing Incidence Reflector and Methods for Manufacturing a Device
- Patent Title (中): 放射入射反射器，平版印刷设备，制造放射入射反射器的方法和制造器件的方法
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Application No.: US13983214Application Date: 2012-01-18
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Publication No.: US20140078486A1Publication Date: 2014-03-20
- Inventor: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2012/050676 WO 20120118
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/08
Abstract:
A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.
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