Invention Application
US20140233025A1 Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
审中-公开
用于角度分辨光谱光刻特征的方法和装置
- Patent Title: Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
- Patent Title (中): 用于角度分辨光谱光刻特征的方法和装置
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Application No.: US14264547Application Date: 2014-04-29
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Publication No.: US20140233025A1Publication Date: 2014-08-21
- Inventor: Arie Jeffrey Maria DEN BOEF , Arno Jan BLEEKER , Youri Johannes Laurentius Maria VAN DOMMELEN , Mircea DUSA , Antoine Gaston Marie KIERS , Paul Frank LUEHRMANN , Henricus Petrus Maria PELLEMANS , Maurits VAN DER SCHAAR , Cedric Desire GROUWSTRA , Markus Gerardus Martinus VAN KRAAIJ
- Applicant: ASML, Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G01N21/88
- IPC: G01N21/88
Abstract:
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
Public/Granted literature
- US10241055B2 Method and apparatus for angular-resolved spectroscopic lithography characterization Public/Granted day:2019-03-26
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