Invention Application
- Patent Title: INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS
- Patent Title (中): 检查高分辨光刻胶片
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Application No.: US14251312Application Date: 2014-04-11
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Publication No.: US20140307943A1Publication Date: 2014-10-16
- Inventor: Fred Stanke , Ilya Toytman , David Alles , Gregg Anthony Inderhees , Stanley E. Stokowski , Mehdi Vaez-Iravani
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/95

Abstract:
Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
Public/Granted literature
- US09619878B2 Inspecting high-resolution photolithography masks Public/Granted day:2017-04-11
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