Invention Application
US20140307943A1 INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS 有权
检查高分辨光刻胶片

INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS
Abstract:
Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
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