Invention Application
US20140363072A1 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY
有权
自组装聚合物及其在LITHOGRAPHY中的使用方法
- Patent Title: SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY
- Patent Title (中): 自组装聚合物及其在LITHOGRAPHY中的使用方法
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Application No.: US14369995Application Date: 2013-01-15
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Publication No.: US20140363072A1Publication Date: 2014-12-11
- Inventor: Christianus Martinus Van Heesch , Hieronymus Johannus Christiaan Meessen
- Applicant: ASML Netherlands B.V.
- International Application: PCT/EP2013/050673 WO 20130115
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01B11/03

Abstract:
A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.
Public/Granted literature
- US09367910B2 Self-assemblable polymer and methods for use in lithography Public/Granted day:2016-06-14
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