Invention Application
US20140373571A1 FUSED SILICA GLASS ARTICLE HAVING IMPROVED RESISTANCE TO LASER DAMAGE
审中-公开
熔融二氧化硅玻璃制品具有改善的耐光损伤性能
- Patent Title: FUSED SILICA GLASS ARTICLE HAVING IMPROVED RESISTANCE TO LASER DAMAGE
- Patent Title (中): 熔融二氧化硅玻璃制品具有改善的耐光损伤性能
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Application No.: US14269409Application Date: 2014-05-05
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Publication No.: US20140373571A1Publication Date: 2014-12-25
- Inventor: Kenneth Edward Hrdina , Changyi Lai , Lisa Anne Moore , Ulrich Wilhelm Heinz Neukirch , William Rogers Rosch
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Main IPC: C03C23/00
- IPC: C03C23/00

Abstract:
A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight.
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