Invention Application
- Patent Title: EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
- Patent Title (中): EXCIMER激光设备和激光激光系统
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Application No.: US14487796Application Date: 2014-09-16
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Publication No.: US20150003485A1Publication Date: 2015-01-01
- Inventor: Tooru ABE , Takeshi OHTA , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Priority: JP2011234057 20111025; JP2012160399 20120719
- Main IPC: H01S3/036
- IPC: H01S3/036 ; H01S3/097

Abstract:
An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Public/Granted literature
- US09425576B2 Excimer laser apparatus and excimer laser system Public/Granted day:2016-08-23
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