Invention Application
US20150014030A1 COMPOSITION FOR FORMING SILVER ION DIFFUSION-SUPPRESSING LAYER, FILM FOR SILVER ION DIFFUSION-SUPPRESSING LAYER, CIRCUIT BOARD, ELECTRONIC DEVICE, CONDUCTIVE FILM LAMINATE, AND TOUCH PANEL
有权
用于形成银离子扩散层的组合物,用于银离子扩散抑制层的膜,电路板,电子器件,导电膜层压板和触控面板
- Patent Title: COMPOSITION FOR FORMING SILVER ION DIFFUSION-SUPPRESSING LAYER, FILM FOR SILVER ION DIFFUSION-SUPPRESSING LAYER, CIRCUIT BOARD, ELECTRONIC DEVICE, CONDUCTIVE FILM LAMINATE, AND TOUCH PANEL
- Patent Title (中): 用于形成银离子扩散层的组合物,用于银离子扩散抑制层的膜,电路板,电子器件,导电膜层压板和触控面板
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Application No.: US14467680Application Date: 2014-08-25
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Publication No.: US20150014030A1Publication Date: 2015-01-15
- Inventor: Yasuhiro MITAMURA , Masaya NAKAYAMA , Yuki MATSUNAMI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2012-042304 20120228; JP2012-064114 20120321; JP2012-167157 20120727
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/09 ; H01B3/44

Abstract:
A composition for forming a silver ion diffusion-suppressing layer includes an insulating resin and a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group optionally containing a heteroatom, with the total number of carbon atoms in the hydrocarbon group or groups being 5 or more. The composition for forming a silver ion diffusion-suppressing layer allows formation of a silver ion diffusion-suppressing layer capable of suppressing silver ion migration between metal interconnects containing silver or a silver alloy to improve the reliability on the insulation between the metal interconnects.
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