Invention Application
- Patent Title: METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE
- Patent Title (中): 制造光电转换装置的方法
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Application No.: US14478219Application Date: 2014-09-05
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Publication No.: US20150087107A1Publication Date: 2015-03-26
- Inventor: Hiroki HIRAGA , Naoyuki NAKAGAWA , Soichiro SHIBASAKI , Mutsuki YAMAZAKI , Kazushige YAMAMOTO , Shinya SAKURADA , Michihiko INABA
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Priority: JP2013-196115 20130920
- Main IPC: H01L31/20
- IPC: H01L31/20 ; H01L31/032

Abstract:
A method for manufacturing a photoelectric conversion device of an embodiment includes forming, on a first electrode, a photoelectric conversion layer comprising at least one of a chalcopyrite compound, a stannite compound, and a kesterite compound. The forming of the photoelectric conversion layer includes forming a photoelectric conversion layer precursor comprising at least one compound semiconductor of a chalcopyrite compound, a stannite compound, and a kesterite compound on the first electrode. The forming of the photoelectric conversion layer includes immersing the precursor in a liquid including at least one of Group IIa and Group IIb elements at 0° C. to 60° C., after forming of the photoelectric conversion layer precursor. The compound semiconductor on a side of the first electrode is at least either amorphous or larger in average crystal grain size than the compound semiconductor on an opposite side of the first electrode.
Information query
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