Invention Application
US20150300815A1 Periodic Patterns and Techniques to Control Misalignment Between Two Layers
审中-公开
周期性模式和技术来控制两层之间的对准
- Patent Title: Periodic Patterns and Techniques to Control Misalignment Between Two Layers
- Patent Title (中): 周期性模式和技术来控制两层之间的对准
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Application No.: US14789796Application Date: 2015-07-01
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Publication No.: US20150300815A1Publication Date: 2015-10-22
- Inventor: Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
- Applicant: KLA-Tencor Corporation
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01N21/95 ; G01B11/26
Abstract:
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Public/Granted literature
- US09234745B2 Periodic patterns and techniques to control misalignment between two layers Public/Granted day:2016-01-12
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