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Invention Application
US20150355557A1 Gas Flow Optimization in Reticle Stage Environment 审中-公开
标线段环境气流优化

Gas Flow Optimization in Reticle Stage Environment
Abstract:
A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
Abstract(Chinese):

公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。

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