Invention Application
US20160069739A1 Light Sensor with Chemically Resistant and Robust Reflector Stack
有权
具有耐化学性和坚固反射器叠层的光传感器
- Patent Title: Light Sensor with Chemically Resistant and Robust Reflector Stack
- Patent Title (中): 具有耐化学性和坚固反射器叠层的光传感器
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Application No.: US14827112Application Date: 2015-08-14
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Publication No.: US20160069739A1Publication Date: 2016-03-10
- Inventor: David J. Howard , Jeff Rose , Arjun Kar-Roy , Michael J. DeBar
- Applicant: Newport Fab, LLC dba Jazz Semiconductor
- Assignee: NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTOR
- Current Assignee: NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTOR
- Main IPC: G01J1/04
- IPC: G01J1/04

Abstract:
A light sensor having a chemically resistant and robust reflector stack is disclosed. The reflector stack is formed over a substrate, and includes an adhesion layer, a patterned reflector layer over the adhesion layer, and a smoothing layer over the patterned reflector layer. The patterned reflector layer has a substantially flat top surface. A conformal passivation layer covers the reflector stack. An absorbing layer is situated above the reflector stack and separated from the reflector stack. The absorbing layer is supported by vias over the substrate. The absorbing layer is connected to at least one resistor, where a resistance of the at least one resistor varies in response to light absorbed by the absorbing layer. The vias are disposed on via landing pads on the substrate.
Public/Granted literature
- US09377350B2 Light sensor with chemically resistant and robust reflector stack Public/Granted day:2016-06-28
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