Invention Application
US20160084865A1 INTEGRATED ROTATION RATE AND ACCELERATION SENSOR AND METHOD FOR MANUFACTURING AN INTEGRATED ROTATION RATE AND ACCELERATION SENSOR
审中-公开
一体化转速和加速度传感器及其制造方法,用于制造集成转速和加速度传感器
- Patent Title: INTEGRATED ROTATION RATE AND ACCELERATION SENSOR AND METHOD FOR MANUFACTURING AN INTEGRATED ROTATION RATE AND ACCELERATION SENSOR
- Patent Title (中): 一体化转速和加速度传感器及其制造方法,用于制造集成转速和加速度传感器
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Application No.: US14890527Application Date: 2014-05-05
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Publication No.: US20160084865A1Publication Date: 2016-03-24
- Inventor: Arnd Kaelberer , Jochen Reinmuth , Johannes Classen
- Applicant: ROBERT BOSCH GMBH
- Priority: DE102013208814.0 20130514
- International Application: PCT/EP2014/059060 WO 20140505
- Main IPC: G01P1/00
- IPC: G01P1/00 ; G01C19/56 ; G01P15/02 ; B81C1/00

Abstract:
A micromechanical device having a main plane of extension includes a sensor wafer, an evaluation wafer, and an intermediate wafer situated between the sensor wafer and the evaluation wafer, the evaluation wafer having at least one application-specific integrated circuit. The sensor wafer and/or the intermediate wafer includes a first sensor element and a second sensor element spatially separated from the first sensor element, the first and second sensor elements being respectively located in a first cavity and a second cavity each formed by the intermediate wafer and the sensor wafer, a first gas pressure in the first cavity differing from a second gas pressure in the second cavity, and the intermediate wafer having an opening at a point in a direction perpendicular to the main plane of extension.
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