Invention Application
- Patent Title: AUTO FREQUENCY TUNED REMOTE PLASMA SOURCE
- Patent Title (中): 自动频率调谐远程等离子体源
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Application No.: US14863153Application Date: 2015-09-23
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Publication No.: US20160086772A1Publication Date: 2016-03-24
- Inventor: Abdul Aziz KHAJA , Mohamad A. AYOUB , Ramesh BOKKA , Jay D. PINSON, II , Juan Carlos ROCHA-ALVAREZ
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A remote plasma source is disclosed that includes a core element and a first plasma block including one or more surfaces at least partially enclosing an annular-shaped plasma generating region that is disposed around a first portion of the core element. The remote plasma source further comprises one or more coils disposed around respective second portions of the core element. The remote plasma source further includes an RF power source configured to drive a RF power signal onto the one or more coils that is based on a determined impedance of the plasma generating region. Energy from the RF power signal is coupled with the plasma generating region via the one or more coils and the core element.
Public/Granted literature
- US10083818B2 Auto frequency tuned remote plasma source Public/Granted day:2018-09-25
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