Invention Application
- Patent Title: Transistor with Floating Gate electrode, Manufacturing Method Thereof, Application Method Thereof and Display Driving Circuit
- Patent Title (中): 具有浮栅电极的晶体管及其制造方法及其应用方法及显示驱动电路
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Application No.: US14368145Application Date: 2013-05-08
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Publication No.: US20160111454A1Publication Date: 2016-04-21
- Inventor: Ning CHEN , Wei GUO , Lu WANG
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Priority: CN201310108151.4 20130329
- International Application: PCT/CN2013/075310 WO 20130508
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; H01L29/417 ; H01L29/49 ; H01L29/51 ; H01L29/66 ; H01L21/02 ; H01L21/265 ; H01L21/311 ; H01L21/3213 ; H01L29/423 ; H01L29/16 ; H01L29/04 ; H01L21/28 ; G02F1/133 ; G09G3/20 ; H01L29/788

Abstract:
Embodiments of the disclosure disclose a transistor with floating gate electrode, a manufacturing method thereof, an application method thereof and a display driving circuit. The transistor with floating gate electrode includes a substrate (1), and a floating gate electrode (3), a source electrode (4), a drain electrode (5) and a control gate electrode (6) disposed on the substrate (1). The transistor with floating gate electrode further comprises a first insulating film (7) and a polysilicon film (8) that are sequentially disposed on the substrate (1), and a channel region (2) is formed in the polysilicon film (8) at a position corresponding to the floating gate electrode (3).
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Information query
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