Invention Application
US20160116421A1 DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS 审中-公开
缺陷检查方法和缺陷检查装置

DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS
Abstract:
A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.
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