Invention Application
US20160163409A1 OPTICAL DESIGN METHOD FOR X-RAY FOCUSING SYSTEM USING ROTATING MIRROR, AND X-RAY FOCUSING SYSTEM 有权
使用旋转镜的X射线聚焦系统的光学设计方法和X射线聚焦系统

  • Patent Title: OPTICAL DESIGN METHOD FOR X-RAY FOCUSING SYSTEM USING ROTATING MIRROR, AND X-RAY FOCUSING SYSTEM
  • Patent Title (中): 使用旋转镜的X射线聚焦系统的光学设计方法和X射线聚焦系统
  • Application No.: US14904494
    Application Date: 2014-02-03
  • Publication No.: US20160163409A1
    Publication Date: 2016-06-09
  • Inventor: Hiroto MOTOYAMAHidekazu MIMURA
  • Applicant: THE UNIVERSITY OF TOKYO
  • Applicant Address: JP Tokyo
  • Assignee: The University of Tokyo
  • Current Assignee: The University of Tokyo
  • Current Assignee Address: JP Tokyo
  • Priority: JP2013-147116 20130712
  • International Application: PCT/JP2014/052395 WO 20140203
  • Main IPC: G21K1/06
  • IPC: G21K1/06
OPTICAL DESIGN METHOD FOR X-RAY FOCUSING SYSTEM USING ROTATING MIRROR, AND X-RAY FOCUSING SYSTEM
Abstract:
An object of the invention is to provide a novel optical design method for an X-ray focusing system capable of collecting all the fluxes, while applying an X-ray of a very small divergence angle to the entire surface of a rotating mirror. The method includes a step of determining the shape of a rotating mirror (3) provided with a reflection surface, the reflection surface being formed by rotating, by one turn around an optical axis (OA), a one-dimensional profile composed of an ellipse or a part of combination of the ellipse and a hyperbolic curve, the ellipse including a downstream focal point (F) serving as a light collecting point of the X-ray focusing system, and including an upstream focal point (F1) deviated from the optical axis (OA); and a step of determining the shape of a reflection surface of an annular focusing mirror (4).
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