Invention Application
US20160163409A1 OPTICAL DESIGN METHOD FOR X-RAY FOCUSING SYSTEM USING ROTATING MIRROR, AND X-RAY FOCUSING SYSTEM
有权
使用旋转镜的X射线聚焦系统的光学设计方法和X射线聚焦系统
- Patent Title: OPTICAL DESIGN METHOD FOR X-RAY FOCUSING SYSTEM USING ROTATING MIRROR, AND X-RAY FOCUSING SYSTEM
- Patent Title (中): 使用旋转镜的X射线聚焦系统的光学设计方法和X射线聚焦系统
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Application No.: US14904494Application Date: 2014-02-03
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Publication No.: US20160163409A1Publication Date: 2016-06-09
- Inventor: Hiroto MOTOYAMA , Hidekazu MIMURA
- Applicant: THE UNIVERSITY OF TOKYO
- Applicant Address: JP Tokyo
- Assignee: The University of Tokyo
- Current Assignee: The University of Tokyo
- Current Assignee Address: JP Tokyo
- Priority: JP2013-147116 20130712
- International Application: PCT/JP2014/052395 WO 20140203
- Main IPC: G21K1/06
- IPC: G21K1/06

Abstract:
An object of the invention is to provide a novel optical design method for an X-ray focusing system capable of collecting all the fluxes, while applying an X-ray of a very small divergence angle to the entire surface of a rotating mirror. The method includes a step of determining the shape of a rotating mirror (3) provided with a reflection surface, the reflection surface being formed by rotating, by one turn around an optical axis (OA), a one-dimensional profile composed of an ellipse or a part of combination of the ellipse and a hyperbolic curve, the ellipse including a downstream focal point (F) serving as a light collecting point of the X-ray focusing system, and including an upstream focal point (F1) deviated from the optical axis (OA); and a step of determining the shape of a reflection surface of an annular focusing mirror (4).
Public/Granted literature
- US09892811B2 Optical design method for X-ray focusing system using rotating mirror, and X-ray focusing system Public/Granted day:2018-02-13
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