Invention Application
US20160203886A1 COMPOSITION FOR FORMING CONDUCTIVE PATTERN AND RESIN STRUCTURE HAVING CONDUCTIVE PATTERN THEREON
审中-公开
形成导电图案的组合物和具有导电图案的树脂结构
- Patent Title: COMPOSITION FOR FORMING CONDUCTIVE PATTERN AND RESIN STRUCTURE HAVING CONDUCTIVE PATTERN THEREON
- Patent Title (中): 形成导电图案的组合物和具有导电图案的树脂结构
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Application No.: US14913265Application Date: 2014-12-17
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Publication No.: US20160203886A1Publication Date: 2016-07-14
- Inventor: Han Nah JEONG , Cheol-Hee PARK , Sang Yun JUNG , Jae Jin KIM , Chee-Sung PARK , Jae Hyun KIM , Shin Hee JUN
- Applicant: LG CHEM, LTD.
- Priority: KR10-2013-0167675 20131230; KR10-2014-0181437 20141216
- International Application: PCT/KR2014/012487 WO 20141217
- Main IPC: H01B1/22
- IPC: H01B1/22 ; H05K1/09

Abstract:
This disclosure relates to a composition for forming a conductive pattern that enables formation of fine conductive pattern on various polymer resin products or resin layers by a simplified process, and more effectively fulfills requirements of the art such as realization of various colors and the like, and a resin structure having a conductive pattern. The composition for forming a conductive pattern comprises a polymer resin; and a non-conductive metal compound including a first metal and a second metal, having a NASICON crystal structure represented by the following Chemical Formula 1, wherein a metal nucleus including the first metal or an ion thereof is formed from the non-conductive metal compound by electromagnetic irradiation.
Public/Granted literature
- US10121566B2 Composition from forming conductive pattern and resin structure having conductive pattern thereon Public/Granted day:2018-11-06
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