Invention Application
US20160204316A1 SEMICONDUCTOR OPTOELECTRONIC DEVICE WITH AN INSULATIVE PROTECTION LAYER AND THE MANUFACTURING METHOD THEREOF 审中-公开
具有绝缘保护层的半导体光电器件及其制造方法

  • Patent Title: SEMICONDUCTOR OPTOELECTRONIC DEVICE WITH AN INSULATIVE PROTECTION LAYER AND THE MANUFACTURING METHOD THEREOF
  • Patent Title (中): 具有绝缘保护层的半导体光电器件及其制造方法
  • Application No.: US15079812
    Application Date: 2016-03-24
  • Publication No.: US20160204316A1
    Publication Date: 2016-07-14
  • Inventor: Chiu-Lin YAOChih-Chiang LU
  • Applicant: Epistar Corporation
  • Priority: TW098146164 20091230
  • Main IPC: H01L33/46
  • IPC: H01L33/46 H01L33/64 H01L25/075 H01L33/62
SEMICONDUCTOR OPTOELECTRONIC DEVICE WITH AN INSULATIVE PROTECTION LAYER AND THE MANUFACTURING METHOD THEREOF
Abstract:
The present disclosure is to provide an optoelectronic device. The optoelectronic device comprises a heat dispersion substrate; an insulative protection layer on the heat dispersion substrate, wherein the insulative protection layer comprises AlInGaN series material; and an optoelectronic unit comprising an epitaxial structure comprising multiple layers on the insulative protection layer, wherein at least one layer of the epitaxial structure comprises III-V group material devoid of nitride.
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