Invention Application
US20160334572A1 SEMICONDUCTOR DEVICE WITH INTEGRATED MIRROR AND METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH INTEGRATED MIRROR
有权
具有集成镜的半导体器件及其制造具有集成反射镜的半导体器件的方法
- Patent Title: SEMICONDUCTOR DEVICE WITH INTEGRATED MIRROR AND METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH INTEGRATED MIRROR
- Patent Title (中): 具有集成镜的半导体器件及其制造具有集成反射镜的半导体器件的方法
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Application No.: US15101406Application Date: 2014-11-17
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Publication No.: US20160334572A1Publication Date: 2016-11-17
- Inventor: Jochen KRAFT , Joerg SIEGERT , Ewald STUECKLER
- Applicant: AMS AG
- Priority: EP13195512.2 20131203
- International Application: PCT/EP2014/074786 WO 20141117
- Main IPC: G02B6/122
- IPC: G02B6/122 ; G02B6/132
Abstract:
The semiconductor device comprises a substrate (1) of semiconductor material, a dielectric layer (2) above the substrate, a waveguide (3) arranged in the dielectric layer, and a mirror region (4) arranged on a surface of a mirror support (5) integrated on the substrate. A mirror is thus formed facing the waveguide. The surface of the mirror support and hence the mirror are inclined with respect to the waveguide.
Public/Granted literature
Information query
