Invention Application
- Patent Title: Method of Metrology, Inspection Apparatus, Lithographic System and Device Manufacturing Method
- Patent Title (中): 计量,检验仪器,平版印刷系统和器件制造方法
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Application No.: US15186031Application Date: 2016-06-17
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Publication No.: US20160370710A1Publication Date: 2016-12-22
- Inventor: Peter Hanzen WARDENIER , Frank STAALS , Jean-Pierre Agnes Henricus Mar VAESSEN , Hans VAN DER LAAN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15172709.6 20150618
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/03

Abstract:
Disclosed is a method of determining a correction for measured values of radiation diffracted from a target comprising a plurality of periodic structures, subsequent to measurement of the target using measurement radiation defining a measurement field. The correction acts to correct for measurement field location dependence in the measured values. The method comprises performing a first and second measurements of the periodic structures; and determining a correction from said first measurement and said second measurement. The first measurement is performed with said target being in a normal measurement location with respect to the measurement field. The second measurement is performed with the periodic structure in a shifted location with respect to the measurement field, said shifted location comprising the location of another of said periodic structures when said target is in said normal measurement location with respect to the measurement field.
Public/Granted literature
- US09958789B2 Method of metrology, inspection apparatus, lithographic system and device manufacturing method Public/Granted day:2018-05-01
Information query
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