Invention Application
- Patent Title: METHOD OF FORMING A METAL LAYER AND METHOD OF MANUFACTURING A SUBSTRATE HAVING SUCH METAL LAYER
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Application No.: US15127433Application Date: 2015-03-12
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Publication No.: US20170130354A1Publication Date: 2017-05-11
- Inventor: Tadahiro NISHIGAWA , Jun HIGUCHI , Hitoshi ISHIKAWA
- Applicant: Atotech Deutschland GmbH
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GMBH
- Current Assignee: Atotech Deutschland GMBH
- Current Assignee Address: DE Berlin
- Priority: JP2014-060460 20140324
- International Application: PCT/EP2015/055201 WO 20150312
- Main IPC: C25D5/34
- IPC: C25D5/34 ; H05K1/02 ; H05K3/42 ; C25D3/38 ; H05K3/46

Abstract:
In a substrate like a printed circuit board comprising an insulator and a copper layer laminated on part of the insulator, the insulator outer surface and the copper layer outer surface are simultaneously subjected to (1) a process including treatment with an alkali metal hydroxide solution, (2) a process including treatment with an alkaline aqueous solution containing an aliphatic amine, (3) a process including treatment with an alkaline aqueous solution having a permanganate concentration of 0.3 to 3.5 wt % and a pH of 8 to 11, (4) a process including treatment with an acidic microemulsion aqueous solution containing a thiophene compound and an alkali metal salt of polystyrenesulphonic acid, and (5) a process including copper electroplating, which are implemented sequentially.
Public/Granted literature
- US09988730B2 Method of forming a metal layer and method of manufacturing a substrate having such metal layer Public/Granted day:2018-06-05
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