Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US15391888Application Date: 2016-12-28
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Publication No.: US20170243973A1Publication Date: 2017-08-24
- Inventor: Sungsam LEE , Junsoo KIM , Hyoshin AHN , Satoru YAMADA , Joohyun JEON , MoonYoung JEONG , Chunhyung CHUNG , Min Hee CHO , Kyo-Suk CHAE , Eunae CHOI
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Priority: KR10-2016-0021242 20160223
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/04 ; H01L29/423

Abstract:
A semiconductor device including a semiconductor substrate including a trench, the semiconductor substrate having a crystal structure; and an insulating layer covering an inner sidewall of the trench, wherein the inner sidewall of the trench has at least one plane included in a {320} family of planes of the crystal structure or at least one plane similar to the {320} family of planes.
Public/Granted literature
- US10431680B2 Semiconductor device and method for manufacturing the same Public/Granted day:2019-10-01
Information query
IPC分类: